Editorial/ Board members

Editor : Sylvanus N. Wosu

University Of Pittsburgh

USA

2

Editor : Ray T. Chen

The University Of Texas

USA

2

Editor : Qiming Zhang

The Pennsylvania State University

USA

2

Editor : Ponisseril Somasundaran

Columbia University

USA

2

Editor : Tuoqi Li

The Dow Chemical Company

USA

2

Editor : R.M Chandima Ratnayake

University Of Stavanger

Norway

2

Editor : Pagona Papakonstantinou

Ulster University

UK

2

Editor : Ramesh K. Agarwal

Washington University In St. Louis

USA

2

Editor : Amir Davijani

Bolt Threads

USA

2

Editor : Siyuan He

Ryerson University

Canada

2

Editor : Dmitry Volodkin

Nottingham Trent University

UK

2

Editor : Chen Hechun

Jiangsu College Of Engineering And Technology

China

2

Editor : Jang Wook Choi

Korea Advanced Institute Of Science And Technology

Korea

2

Editor : Gu Xu

McMaster University

Canada

2

Editor : Ling Bing Kong

Nanyang Technological University

Singapore

2

Editor : Germa Garcia Belmonte

Universitat Jaume I

Spain

2

Editor : Yang Yang

University Of Central Florida

USA

2

Editor : Ruitao Lv

Tsinghua University

China

2

Editor : Daolun Chen

Ryerson University

Canada

2

Editor : Norihiro Shimoi

Tohoku University

Japan

2

Editor : Jeong Yong Lee

KAIST

South Korea

Editor : Evangelos Hinis

National Technical University Of Athens

Greece

2

Editor : Khurram Shahzad Baig

Ryerson University

Canada

2

Editor : Chun Liu

University Of Michigan

USA

2

Editor : Chun Cheng

Southern University Of Science And Technology

China

2

Editor : Huey-Shan Hung

China Medical University

Taiwan

2

Editor : Yonsil Park

University Of Minnesota

USA

2

Editor : Alireza Heidari

California South University

USA

2

Editor : Dimitrios G. Pavlou

University Of Stavanger

Norway

2

Editor : Iman Soltani

University Of Minnesota Duluth

USA

2

Editor : Luisa Molari

University Of Bologna

Italy

2

Editor : Nasser Varahram

Sharif University Of Technology

USA

2

Editor : Pinaki Mukherjee

Rutgers University

USA

2

Editor : Chih-Yu Chang

Feng Chia University

Taiwan

2

Editor : Sayantan Majumdar

University Of Chicago

USA

2

Editor : Maria Criado Sanz

The University Of Sheffield

UK

2

Editor : Hongli (Julie) Zhu

Northeastern University

USA

2

Editor : Hui Zhang

Monash University

Australia

2

Editor : Kun Liang

University Of Central Florida

USA

2

Editor : Beibei Jiang

Materials Analytical Services

USA

2

Editor : Zuoti Xie

University Of Minnesota

USA

2

Editor : Sukanya Murali

The State University Of New Jersey

USA

2

Editor : Chiara Ingrosso

Italian National Research Council-Institute For Physical And Chemical Processes

Italy

2

Editor : Liyi Li

Intel Corporatio

USA

2

Editor : Antoine Brehault

Rutgers University

USA

2

Editor : Srimoyee Dasgupta

University Of Delaware

USA

2

Editor : XinRan Zhou

University Of Delaware

USA

2

Editor : Atta Ullah Khan

Rutgers University

USA

2

Editor : Prahlad Kumar Routh

Stony Brook University

USA

2

Editor : Mani Kuntal Sen

Stony Brook University

USA

Editor : Felipe Augusto Vieira Braga

Cambridge University

UK

Reviewer Board Members

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